The process of overheating the dielectric film to form impurities

Based on the unique properties of laser cleaning for ultra-smooth optical substrates and experimental findings, this paper explores the challenges and potential of applying laser technology in the cleaning process of such surfaces. It further investigates the mechanism behind particle removal. The method involves depositing a thin water film—on the order of microns—onto the semiconductor wafer surface, followed by irradiation with a microsecond-pulsed laser. Due to the high energy concentration in both time and space, the water film becomes severely overheated during the pulse, leading to rapid vaporization and explosive bubble formation. Experimental results have demonstrated that this technique can effectively remove impurity particles, even those as small as submicron-sized, significantly enhancing the yield and performance of semiconductor chips. However, applying this technique to clean micro-polishing residues left on the ultra-smooth surface of optical substrates presents several challenges. Most optical substrates have low or no absorption of the laser light used in the cleaning process, making it difficult to generate sufficient heat for effective cleaning. As a result, the heating of the dielectric layer cannot rely solely on heat conduction from the substrate's surface. Instead, optimizing the thickness of the particulate dielectric film adsorbed on the ultra-smooth surface is crucial for controlling the explosion of the dielectric fluid. This optimization can be achieved through numerical simulation methods, allowing for precise parameter tuning. The temperature of the substrate’s surface layer becomes quite high, and the heat penetration depth increases, meaning the matrix absorbs more heat. Even though the substrate itself does not directly absorb the laser light, heat exchange between the dielectric layer and the substrate plays a significant role in determining the temperature distribution within the dielectric film. Therefore, when modeling the laser cleaning process, it is essential not to assume that the dielectric layer is thermally isolated from the substrate. Once the temperature field is known, the process of superheating the dielectric film, forming bubbles, and impacting the contaminant particles can be further analyzed. The dielectric film melts into a liquid state, and the impact velocity of the fluid can be estimated based on the growth rate of the bubbles formed. Although the surrounding medium may be at a higher temperature, bubble formation is primarily influenced by interfacial effects and surface tension. This understanding is critical for improving the efficiency and effectiveness of laser cleaning in ultra-smooth optical applications.

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